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Journal Articles

Measurement of the spatial polarization distribution of circularly polarized gamma rays produced by inverse Compton scattering

Taira, Yoshitaka*; Endo, Shunsuke; Kawamura, Shiori*; Nambu, Taro*; Okuizumi, Mao*; Shizuma, Toshiyuki*; Omer, M.; Zen, H.*; Okano, Yasuaki*; Kitaguchi, Masaaki*

Physical Review A, 107(6), p.063503_1 - 063503_10, 2023/06

 Times Cited Count:0 Percentile:0.01(Optics)

no abstracts in English

Journal Articles

Evaluation of analyzing power of gamma-ray polarimeter

Endo, Shunsuke; Shizuma, Toshiyuki*; Zen, H.*; Taira, Yoshitaka*; Omer, M.; Kawamura, Shiori*; Abe, Ryota*; Okudaira, Takuya*; Kitaguchi, Masaaki*; Shimizu, Hirohiko*

UVSOR-49, P. 38, 2022/08

Journal Articles

Sorption behavior of selenide on montmorillonite

Sugiura, Yuki; Tomura, Tsutomu*; Ishidera, Takamitsu; Doi, Reisuke; Francisco, P. C. M.; Shiwaku, Hideaki; Kobayashi, Toru; Matsumura, Daiju; Takahashi, Yoshio*; Tachi, Yukio

Journal of Radioanalytical and Nuclear Chemistry, 324(2), p.615 - 622, 2020/05

 Times Cited Count:4 Percentile:44.4(Chemistry, Analytical)

Journal Articles

Microanalysis of silica-based adsorbent for effective recovery of radioactive elements

Sano, Yuichi; Watanabe, So; Matsuura, Haruaki*; Nagoshi, Kohei*; Arai, Tsuyoshi*

Journal of Nuclear Science and Technology, 54(10), p.1058 - 1064, 2017/10

 Times Cited Count:5 Percentile:44.07(Nuclear Science & Technology)

For effective recovery of radioactive elements by adsorbents using polymer-immobilized silica (SiO$$_{2}$$-P) supports, the microstructure of SiO$$_{2}$$-P particles impregnated with CMPO as extractants and their change with the crosslinking degree of polymer (CDP) were investigated using STXM and EXAFS analyses; further, their relation with adsorption/elution behavior was discussed. The adsorption/elution tests using adsorbents with a different CDP demonstrated that a higher CDP inhibited the elution of adsorbed metal ions from the adsorbent. The results of STXM and EXAFS analyses suggested that adsorption by CMPO proceeds through the entire area in the adsorbent and the local structure around adsorbed metal ions is similar irrespective of the CDP. Conversely, STXM analyses implied the capture of eluents such as H$$_{2}$$O by polymers with high CDP, which suppresses the prompt elution of adsorbed metal ions from the adsorbent.

Journal Articles

Modeling of initial interaction between the laser pulse and Sn droplet target and pre-plasma formation for the LPP EUV source

Sasaki, Akira; Nishihara, Katsunobu*; Sunahara, Atsushi*; Nishikawa, Takeshi*

Proceedings of SPIE, Vol.9776, p.97762C_1 - 97762C_6, 2016/03

 Times Cited Count:1 Percentile:52.7(Optics)

For the improvement of efficiency and output of the laser pumped plasma (LPP) extreme ultra-violet (EUV) light source, we present a hydrodynamics model of laser irradiated Sn targets. The model takes liquid/solid to gas transition and mixed phase condition of the flow into account for the calculation of the distribution of the particles produced by the pre-pulse laser irradiation and optimization of the EUV source. Firstly, we investigate the mechanisms of the fragmentation of the target and particle emission, including the effect of the equation of state of Sn, and secondly, an applicable model is proposed based on the analysis.

Journal Articles

Density and X-ray emission profile relationships in highly ionized high-Z laser-produced plasmas

Yoshida, Kensuke*; Fujioka, Shinsuke*; Higashiguchi, Takeshi*; Ugomori, Teruyuki*; Tanaka, Nozomi*; Kawasaki, Masato*; Suzuki, Yuhei*; Suzuki, Chihiro*; Tomita, Kentaro*; Hirose, Ryoichi*; et al.

Applied Physics Letters, 106(12), p.121109_1 - 121109_5, 2015/03

 Times Cited Count:10 Percentile:41.17(Physics, Applied)

Journal Articles

High spatial resolution ZnO scintillator for an in situ imaging device in EUV region

Arita, Ren*; Nakazato, Tomoharu*; Shimizu, Toshihiko*; Yamanoi, Kohei*; Empizo, M.*; Hori, Tatsuhiro*; Fukuda, Kazuhito*; Minami, Yuki*; Sarukura, Nobuhiko*; Maruyama, Momoko; et al.

Optical Materials, 36(12), p.2012 - 2015, 2014/10

 Times Cited Count:9 Percentile:45.56(Materials Science, Multidisciplinary)

A single shot image of a ZnO crystal excited by the EUV laser of Kansai Photon Science Institute was captured. The evaluated EUV beam waist radii from the ZnO emission pattern along the horizontal and vertical axes are 5.0 and 4.7$$mu$$m, respectively. The expected focal spot size of EUV laser and the spatial resolution of the magnifier (including the Schwarzschild objectives and lenses) are however 1 and 4$$mu$$m, respectively. The discrepancy on the spatial resolutions is attributed to exciton diffusion. We estimated the ZnO exciton diffusion length from the effective decay time which is shortened by exciton-exciton collision quenching and which is dependence on excitation energy density. Our results indicate that the short lifetime of ZnO is required to improve the spatial resolution.

Journal Articles

Degradation of Eu(III)-malic acid complexes by $$Pseudomonas fluorescens$$

Nankawa, Takuya; Suzuki, Yoshinori*; Ozaki, Takuo; Onuki, Toshihiko; Francis, A. J.*

Journal of Alloys and Compounds, 408-412, p.1329 - 1333, 2006/02

 Times Cited Count:3 Percentile:28.59(Chemistry, Physical)

We studied the biodegradation of Eu(III)-malic acid complexes by $$Pseudomonas fluorescens$$. Ten milimolar Malic acid was degraded in the absence and in the presence of Eu(III) of 0.05, 0.1, and 0.2 mM. The degradation rate of malic acid increased with decreasing the ratios of Eu(III) to malic acid. These results suggest that the toxicity of Eu(III) can be masked through its complexation with malic acid. The degradation of malic acid was followed by the production of unidentified metabolites which were associated with Eu(III). One of the unidentified organic acids was analysed to be pyruvic acid. Our findings suggest that metabolites can influence the environmental behavior of Eu(III) by biologically transformed through subsequent complexation with Eu(III).

Journal Articles

Radiation loss by impurities measured from the large helical device

Kato, Takako*; Murakami, Izumi*; Goto, Motoshi*; Morita, Shigeru*; Ida, Katsumi*; Peterson, B. J.*; Funaba, Hisamichi*; Nakano, Tomohide

Journal of Plasma and Fusion Research SERIES, Vol.7, p.1 - 4, 2006/00

We analyzed impurity VUV spectral emission quantitatively. Electron temperature is derived from the intensity ratio of CIII line intensities. Radiation loss sources are identified using spectroscopy and bolometer in the case of radiation collapse caused by neon gas puffing. Time dependent radiation loss of impurity ions are derived from line intensities of impurities.

Journal Articles

Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas

Fujioka, Shinsuke*; Nishimura, Hiroaki*; Nishihara, Katsunobu*; Sasaki, Akira; Sunahara, Atsushi*; Okuno, Tomoharu*; Ueda, Nobuyoshi*; Ando, Tsuyoshi*; Tao, Y.*; Shimada, Yoshinori*; et al.

Physical Review Letters, 95(23), p.235004_1 - 235004_4, 2005/12

 Times Cited Count:147 Percentile:95.57(Physics, Multidisciplinary)

no abstracts in English

Journal Articles

Approach to optimize conversion efficiency of discharge-pumped plasma extreme ultraviolet sources

Masnavi, M.*; Nakajima, Mitsuo*; Sasaki, Akira; Hotta, Eiki*; Horioka, Kazuhiko*

Applied Physics Letters, 87(11), p.111502_1 - 111502_3, 2005/09

 Times Cited Count:4 Percentile:17.85(Physics, Applied)

no abstracts in English

Journal Articles

Characterization of extreme ultraviolet emission from laser-produced spherical tin plasma generated with multiple laser beams

Shimada, Yoshinori*; Nishimura, Hiroaki*; Nakai, Mitsuo*; Hashimoto, Kazuhisa*; Yamaura, Michiteru*; Tao, Y.*; Shigemori, Keisuke*; Okuno, Tomoharu*; Nishihara, Katsunobu*; Kawamura, Toru*; et al.

Applied Physics Letters, 86(5), p.051501_1 - 051501_3, 2005/01

 Times Cited Count:113 Percentile:94.31(Physics, Applied)

no abstracts in English

Journal Articles

Effect of the satellite lines and opacity on the extreme ultraviolet emission from high-density Xe plasmas

Sasaki, Akira; Nishihara, Katsunobu*; Murakami, Masakatsu*; Koike, Fumihiro*; Kagawa, Takashi*; Nishikawa, Takeshi*; Fujima, Kazumi*; Kawamura, Toru*; Furukawa, Hiroyuki*

Applied Physics Letters, 85(24), p.5857 - 5859, 2004/12

 Times Cited Count:43 Percentile:79.97(Physics, Applied)

no abstracts in English

Journal Articles

Characteristics of extreme ultraviolet radiation conversion efficiency of a xenon plasma

Masnavi, M.*; Nakajima, Mitsuo*; Sasaki, Akira; Hotta, Eiki*; Horioka, Kazuhiko*

Japanese Journal of Applied Physics, 43(12), p.8285 - 8291, 2004/12

 Times Cited Count:5 Percentile:23.95(Physics, Applied)

no abstracts in English

Journal Articles

Role of UV light illumination and DMF soaking in production of PET ion track membranes

Zhu, Z.; Maekawa, Yasunari; Koshikawa, Hiroshi; Suzuki, Yasuyuki; Yonezawa, Noriyuki*; Yoshida, Masaru

Nuclear Instruments and Methods in Physics Research B, 217(3), p.449 - 456, 2004/05

 Times Cited Count:20 Percentile:76.47(Instruments & Instrumentation)

The pretreatment effects using UV light illumination and DMF soaking on bulk and track etching rates of PET films were investigated. The wavelength of illuminated UV light plays an important role in sensitizing track etching. Illumination with the light at wavelengths longer than 320nm showed strong enhancement in the track etching rates without influence on the bulk etching rates, whereas light with the wavelengths lower than 320nm causes large enhancement in both track and bulk etching rates even in the interior of the material. The track etching rate is found to be not constant along ion tracks, which is attributed to the inhomogeneous distribution of reactive chemical species induced during post-UV light illumination. Furthermore, the DMF soaking of PET after UV light illumination can enhance the etching sensitivity of the track by more than 100 times. The phenomenon is attributed to the high diffusion of organic solution along tracks after UV light illumination.

Journal Articles

Laser produced plasma for EUV light source for lithography

Nishihara, Katsunobu*; Nishimura, Hiroaki*; Mochizuki, Takayasu*; Sasaki, Akira

Reza Kenkyu, 32(5), p.330 - 336, 2004/05

no abstracts in English

Journal Articles

Theoretical simulation of extreme UV radiation source for lithography

Fujima, Kazumi*; Nishihara, Katsunobu*; Kawamura, Toru*; Furukawa, Hiroyuki*; Kagawa, Takashi*; Koike, Fumihiro*; More, R.*; Murakami, Masakatsu*; Nishikawa, Takeshi*; Sasaki, Akira; et al.

Emerging Lithographic Technologies VIII, Proceedings of SPIE Vol.5374, p.405 - 412, 2004/00

no abstracts in English

Journal Articles

Spectroscopic diagnostics for ITER

Sugie, Tatsuo; Costley, A. E.*; Malaquias, A.*; Walker, C.*

Purazuma, Kaku Yugo Gakkai-Shi, 79(10), p.1051 - 1061, 2003/10

The main regions - the core, the edge, the scrape-off layer, and the divertor - will be probed by an extensive array of spectroscopic instrumentation covering the visible to X-ray wavelength range. Plasma parameters will be determined including impurity species/density/input-flux, ion temperature, He density, fueling ratio, plasma rotation, effective ionic charge and safety factor q. The measurements will be used for plasma control and in studies to understand and improve the performance of ITER. A diagnostic neutral beam (~100 keV) will be installed for Charge Exchange Recombination Spectroscopy. Motional Stark Effect measurements (for q profile) will be made using the heating beam (1 MeV). Diagnostic components, such as mirrors, windows, and optical fibers etc, mounted close to the plasma will experience higher levels of radiation due to neutron, gamma ray and particle irradiations than in present devices. Potentially their performance characteristics can be degraded and so the materials of the components have to be carefully selected and mitigating methods adopted where possible.

Journal Articles

Why does hemocyte density rise during the wandering stage of the silkworm, ${it bombyx mori}$?

Ling, E.*; Shirai, Koji*; Kanekatsu, Rensuke*; Kobayashi, Yasuhiko; Tu, Z.; Funayama, Tomoo; Watanabe, Hiroshi; Kiguchi, Kenji*

Journal of Insect Biotechnology and Sericology, 72(2), p.101 - 109, 2003/09

no abstracts in English

Journal Articles

A Comparative study of the radiation hardness of silicon carbide using light ions

Lee, K. K.; Oshima, Takeshi; Saint, A.*; Kamiya, Tomihiro; Jamieson, D. N.*; Ito, Hisayoshi

Nuclear Instruments and Methods in Physics Research B, 210, p.489 - 494, 2003/09

 Times Cited Count:21 Percentile:78.43(Instruments & Instrumentation)

To obtain the information on radiation damage of 6H-SiC devices, ion beam induced charge collection (IBICC) for 6H-SiC schottky diodes irradiated with proton, alpha and carbon micro beam 10$$^{8}$$ to 10$$^{13}$$ ions/cm$$^{2}$$ was studied. No significant difference of degradation was observed between p- and n-substrates irradiated with 2MeV-alpha micro beam. The decrease in IBCC shows a good agreement with the calculation using non ionizing energy loss (NIEL). As a result of ion luminescence and ultra violet photo luminescence, the level of 2.32 eV was observed.

73 (Records 1-20 displayed on this page)